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Interfacial microstructure and electrical properties of HfAlOx thin films on compressively strained Si83Ge17 grown by RF magnetron sputtering

✍ Scribed by X.Y. Qiu; K.C. Chan; P.F. Lee; X.W. Dong; J.Y. Dai

Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 563 KB
Volume: 86
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2009.03.130

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