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Interelectrode plasma parameters and plasma deposition in a hot refractory anode vacuum arc

โœ Scribed by Beilis, I. I.; Keidar, M.; Boxman, R. L.; Goldsmith, S.

Book ID
121298053
Publisher
American Institute of Physics
Year
2000
Tongue
English
Weight
708 KB
Volume
7
Category
Article
ISSN
1070-664X

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โœ I.I. Beilis; A. Shnaiderman; R.L. Boxman ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 480 KB

The radially expanding plasma jet generated in a Hot Refractory Anode Vacuum Arc (HRAVA) was used to deposit thin chromium and titanium films on glass substrates. The arc was sustained between a water-cooled cylindrical cathode and a non-consumed cylindrical tungsten anode separated by a 10 mm gap,

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Conventional metallic film deposition techniques are compared with the hot refractory anode vacuum arc (HRAVA) developed in the last decade. In the HRAVA process, the anode is heated by the arc, and a dense plasma plume of cathode material is formed by re-evaporation of cathode material from the ano