Insulation degradation and anomalous etching phenomena in silicon nitride films prepared by plasma-enhanced deposition

✍ Scribed by Masahiko Maeda; Hiroaki Nakamura

• Publisher: Elsevier Science
• Year: 1984
• Tongue: English
• Weight: 658 KB
• Volume: 112
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(84)90218-9