๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Initial plasma oxidation kinetics of silicon: DC bias effects

โœ Scribed by I. Kamioka; K.G. Nakamura; T. Kawabe; M. Kitajima

Book ID
113205272
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
593 KB
Volume
281-282
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Effects of the DC bias in a molten silic
Effects of the DC bias in a molten silicon bath on its purification and hydrogenation by RF thermal plasma
โœ M. Benmansour; S. Rousseau; D. Morvan ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 766 KB

The aim of this work is the purification and the hydrogenation of metallurgical grade silicon for photovoltaic applications using a thermal plasma process. In addition to the plasma treatment, a DC bias of the liquid silicon was used to increase the kinetics of impurity extraction and hydrogenation