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An ellipsometric study of the effects of DC bias of the plasma oxidation of silicon

✍ Scribed by I. Kamioka; K.G. Nakamura; T. Kawabe; M. Kitajima

Book ID: 103387123
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 348 KB
Volume: 97
Category: Article
ISSN: 0038-1098
DOI: 10.1016/0038-1098(95)00618-4

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