Kinetics of triode mode reactive ion etching of Si(100) wafers by chlorine plasmas: temperature and dc self-bias effects

✍ Scribed by Y. Liu; M.C. Flowers

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 531 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)90133-4