Kinetics of triode mode reactive ion etching of Si(100) wafers by chlorine plasmas: temperature and d.c. self-bias effects : Y. Liu and M. C. Flowers. Vacuum 42(18), 1213 (1991)

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 81 KB
• Volume: 32
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(92)90775-g