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Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized silicon

✍ Scribed by Queeney, K. T.; Weldon, M. K.; Chang, J. P.; Chabal, Y. J.; Gurevich, A. B.; Sapjeta, J.; Opila, R. L.

No coin nor oath required. For personal study only.

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