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Influences of thermal annealing, the electrolyte pH, and current density on the interface state density distribution of anodic MOS structures

✍ Scribed by M. Saglam; A. Türüt; Ç. Nuhoglu; H. Efeoglu; T. Kılıçoglu; M.A. Ebeoglu

No coin nor oath required. For personal study only.

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