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Influence of TiN metal gate on Si/SiO2 surface roughness in N and PMOSFETs

✍ Scribed by L. Thevenod; M. Cassé; M. Mouis; G. Reimbold; F. Fillot; B. Guillaumot; F. Boulanger

Book ID: 104050339
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 287 KB
Volume: 80
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2005.04.037

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