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Influence of the annealing process on properties of Cu/BCN/p-Si structure

โœ Scribed by Sugiyama, Tomohiko; Tai, Tomoyoshi; Okamoto, Akio; Yoshitake, Masaaki; Sugino, Takashi

Book ID
120442350
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
119 KB
Volume
12
Category
Article
ISSN
0925-9635

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๐Ÿ“œ SIMILAR VOLUMES

Influence of thermal annealing process o
Influence of thermal annealing process on electrical properties of Mn films
โœ E Dobierzewska-Mozrzymas; P Biegaล„ski; E Pieciul ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 533 KB

Two groups of Mn films with different mass thicknesses were evaporated onto quartz-glass substrates under vacuum conditions (p = IO-' Pa). The Mn films of the first group were thermally annealed at a temperature of approximately 674 K for half an hour. The other group of the films were obtained with