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Effects of post-annealing by the rapid thermal process on the characteristics of MOCVD-Cu/TiN/Si structures

✍ Scribed by Youn Tae Kim; Chi-Hoon Jun; Dae Yong Kim

Book ID
107458036
Publisher
Springer US
Year
1999
Tongue
English
Weight
392 KB
Volume
28
Category
Article
ISSN
0361-5235

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## Abstract Carbon films are deposited on silica glass fibers by radio‐frequency plasma‐enhanced chemical vapor deposition (rf‐PECVD), and the properties of these optical fibers are improved by rapid thermal annealing. The annealing temperatures are set to 100, 200, 300, 400, 500, 550, 600, and 700