Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition

✍ Scribed by Ting-Yu Chang; Jan-Jen Tze; Dah-Shyang Tsai

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 504 KB
• Volume: 236
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2004.04.022