Direct projection patterning of aluminum on the SiO2 surface by using synchrotron radiation induced growth initiation of thermal chemical vapor deposition

✍ Scribed by Fumihiko Uesugi; Iwao Nishiyama

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 421 KB
• Volume: 62
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(92)90140-s