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Influence of substrate bias voltage on structure and properties of hard Si–B–C–N films prepared by reactive magnetron sputtering

✍ Scribed by Houška, J.; Vlček, J.; Potocký, Š.; Peřina, V.

Book ID
120071524
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
731 KB
Volume
16
Category
Article
ISSN
0925-9635

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We report an investigation concerning the influence of ion bombardment on the nanostructure and physical properties of Zr-Si-N nanocomposite thin films. The films were deposited by reactive magnetron sputtering from individual Zr and Si targets. The Si content was varied by changing the power applie