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Influence of the Substrate Bias Voltage on the Structure of Rutile TiO2 Films Prepared by Dual Cathode DC Unbalanced Magnetron Sputtering

✍ Scribed by Kasemanankul, P.; Witit-Anun, N.; Chaiyakun, S.; Limsuwan, P.

No coin nor oath required. For personal study only.

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