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Influence of sputtering power on structure and photocatalyst properties of DC magnetron sputtered TiO2 thin film

✍ Scribed by P. Pansila; N. Witit-anun; S. Chaiyakun


Book ID
119357487
Publisher
Elsevier
Year
2012
Tongue
English
Weight
411 KB
Volume
32
Category
Article
ISSN
1877-7058

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Titanium dioxide films have been deposited using DC magnetron sputtering technique onto well-cleaned p-silicon substrates at an oxygen partial pressure of 7 Γ‚ 10 -5 mbar and at a sputtering pressure (Ar+O 2 ) of 1 Γ‚ 10 -3 mbar. The deposited films were calcinated at 673 and 773 K. The composition of