𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Influence of sputtering conditions and electron energy on XPS depth profiling of Ge in SiO2

✍ Scribed by S. Oswald; B. Schmidt; K.-H. Heinig


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
167 KB
Volume
40
Category
Article
ISSN
0232-1300

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES