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Influence of processing conditions on CoSi2 formation in the presence of a Ti capping layer

✍ Scribed by C. Detavernier; R.L. Van Meirhaeghe; W. Vandervorst; K. Maex

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
471 KB
Volume
71
Category
Article
ISSN
0167-9317

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