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Influence of oxygen on the ion-beam synthesis of silicon carbide buried layers in silicon

✍ Scribed by V. V. Artamanov; M. Ya. Valakh; N. I. Klyui; V. P. Mel’nik; A. B. Romanyuk; B. N. Romanyuk; V. A. Yukhimchuk


Book ID
110119989
Publisher
Springer
Year
1998
Tongue
English
Weight
91 KB
Volume
32
Category
Article
ISSN
1063-7826

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Silicon oxynitride (Si x O y N z ) buried insulating layers were synthesized by SIMNOX (separation by implanted nitrogen-oxygen) process by 14 N + and 16 O + ion implantation to high fluence levels 1 • 10 17 , 2.5 • 10 17 and 5 • 10 17 ions cm À2 sequentially in the ratio 1:1 at 150 keV into p-type