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Influence of ionization degree on film properties when using high power impulse magnetron sputtering

✍ Scribed by Samuelsson, Mattias; Lundin, Daniel; Sarakinos, Kostas; Björefors, Fredrik; Wälivaara, Bengt; Ljungcrantz, Henrik; Helmersson, U.

No coin nor oath required. For personal study only.

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