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Influence of HfAlO composition on memory effects of metal-oxide-semiconductor capacitors with Al2O3/HfAlO/Al2O3 layers and Pd electrode

✍ Scribed by Gou, Hong-Yan; Chen, Sun; Ding, Shi-Jin; Sun, Qing-Qing; Lu, Hong-Liang; Zhang, David Wei; Wang, Peng-Fei

Book ID: 121657677
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 871 KB
Volume: 529
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2012.07.071

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