Effects of H2O Pretreatment on the Capacitance–Voltage Characteristics of Atomic-Layer-Deposited Al2O3on Ga-Face GaN Metal–Oxide–Semiconductor Capacitors

✍ Scribed by Xiang Liu, Ramya Yeluri, Jing Lu, Umesh K. Mishra

• Book ID: 118816457
• Publisher: Springer US
• Year: 2012
• Tongue: English
• Weight: 486 KB
• Volume: 42
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-012-2246-8