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Inductively coupled plasma chemical vapor deposition silicon nitride for passivation of In0.83Ga0.17As photodiodes

✍ Scribed by Shi, Ming; Shao, Xiumei; Tang, Hengjing; Li, Tao; Wang, Yunji; Li, Xue; Gong, Haimei

Book ID: 125860707
Publisher: Elsevier Science
Year: 2014
Tongue: English
Weight: 845 KB
Volume: 67
Category: Article
ISSN: 1350-4495
DOI: 10.1016/j.infrared.2014.06.003

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