✦ LIBER ✦

The structure and optical properties of silicon nanowires prepared by inductively coupled plasma chemical vapor deposition

✍ Scribed by Yanli Qin; Fei Li; Dequan Liu; Hengqing Yan; Jinxiao Wang; Deyan He

Book ID: 113794253
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 907 KB
Volume: 65
Category: Article
ISSN: 0167-577X
DOI: 10.1016/j.matlet.2011.01.033

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Chemical bonding and composition of sili

Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition

✍ M. Matsuoka; S. Isotani; W. Sucasaire; L.S. Zambom; K. Ogata 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 560 KB

Thin silicon nitride films were prepared at 350 °C by inductively coupled plasma chemical vapor deposition on Si(100) substrates under different NH 3 /SiH 4 or N 2 /SiH 4 gas mixture. The chemical composition and bonding structure of the deposited films were investigated as a function of the process

Study on Characteristic Properties of An

Study on Characteristic Properties of Annealed SiOC Film Prepared by Inductively Coupled Plasma Chemical Vapor Deposition

✍ Oh, T.; Chy Hyung Kim 📂 Article 📅 2010 🏛 IEEE 🌐 English ⚖ 186 KB

Optical properties of nanocrystalline si

Optical properties of nanocrystalline silicon films deposited by plasma-enhanced chemical vapor deposition

✍ Atif Mossad Ali 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 433 KB

Optical, electrical and mechanical prope

Optical, electrical and mechanical properties of nitrogen-rich carbon nitride films deposited by inductively coupled plasma chemical vapor deposition

✍ C Popov; L.M Zambov; M.F Plass; W Kulisch 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 270 KB

Structure and optical properties of MoO3

Structure and optical properties of MoO3 thin films prepared by chemical vapor deposition

✍ Abdellaoui, A. ;Martin, L. ;Donnadieu, A. 📂 Article 📅 1988 🏛 John Wiley and Sons 🌐 English ⚖ 513 KB

Effect of initial crystallized silicon l

Effect of initial crystallized silicon layer on the properties of microcrystalline silicon grown by internal inductively coupled plasma-type plasma enhanced chemical vapor deposition

✍ H.C. Lee; H.B. Kim; G.Y. Yeom; I.H. Park; Y.W. Kim 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 902 KB

Using an internal inductively coupled plasma (ICP)-type-plasma enhanced vapor deposition system, microcrystalline silicon thin films were deposited as a function of H 2 /SiH 4 gas ratio at 180 °C. Especially, the effects of deposition with/without an initial thin silicon layer formed with a very hig