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Increased plasma etch resistance of thin polymeric and photoresist films

✍ Scribed by N. Vourdas; A.G. Boudouvis; E. Gogolides

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 128 KB
Volume: 78-79
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2004.12.060

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