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Incorporation of nitrogen into carbon films produced by PECVD under bias voltage

✍ Scribed by Hartmann, J.; Schreck, M.; Baur, T.; Huber, H.; Assmann, W.; Schuler, H.; Stritzker, B.; Rauschenbach, B.


Book ID
122944428
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
491 KB
Volume
7
Category
Article
ISSN
0925-9635

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## Abstract Plasma enhanced chemical vapour deposition technique (PECVD) was used to grow diamond‐like carbon films using pure methane gas plasma. Structural, optical and mechanical properties of the obtained a‐C:H films were investigated as a function of bias voltage in the range 120–270 V, using