๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

In situ X-ray photoelectron spectroscopy characterization of Al2O3/InSb interface evolution from atomic layer deposition

โœ Scribed by D.M. Zhernokletov; H. Dong; B. Brennan; J. Kim; R.M. Wallace


Book ID
116245065
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
693 KB
Volume
258
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Interface composition of atomic layer de
โœ R. Timm; M. Hjort; A. Fian; C. Thelander; E. Lind; J.N. Andersen; L.-E. Wernerss ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 414 KB

We present a synchrotron-based XPS investigation on the interface between InAs and Al 2 O 3 or HfO 2 layers, deposited by ALD at different temperatures, for InAs substrates with different surface orientations as well as for InAs nanowires. We reveal the composition of the native Oxide and how the hi