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Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy

✍ Scribed by H. Nohira; W. Tsai; W. Besling; E. Young; J. Petry; T. Conard; W. Vandervorst; S. De Gendt; M. Heyns; J. Maes; M. Tuominen

No coin nor oath required. For personal study only.

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