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In situ study of stress evolution during the reaction of a nickel film with a silicon substrate

✍ Scribed by Christian Rivero; Patrice Gergaud; Olivier Thomas; Benoit Froment; Hervé Jaouen

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
408 KB
Volume
76
Category
Article
ISSN
0167-9317

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✍ Toshimasa Wadayama; Yoshihisa Maiwa; Aritada Hatta 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 434 KB

The reaction of dimethylaluminum hydride (DMAH) with a-Si:H:F films prepared by spontaneous chemical vapor deposition (SCVD) has been studied in situ using polarization modulation IR spectroscopy. It is found that SCVD films before DMAH exposure contain SiF2, SiHzF , and Sill 2 species. Upon exposur