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In situ SiN passivation of AlGaN/GaN HEMTs by molecular beam epitaxy

✍ Scribed by Heying, B.; Smorchkova, I.P.; Coffie, R.; Gambin, V.; Chen, Y.C.; Sutton, W.; Lam, T.; Kahr, M.S.; Sikorski, K.S.; Wojtowicz, M.


Book ID
118237534
Publisher
The Institution of Electrical Engineers
Year
2007
Tongue
English
Weight
60 KB
Volume
43
Category
Article
ISSN
0013-5194

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Nonalloyed ohmic contact of AlGaN/GaN HE
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## Abstract Selective area growth (SAG) based on plasma assisted molecular beam epitaxy (PAMBE) was demonstrated to be effective to achieve low contact resistance for nonalloyed ohmic metals. An AlGaN/GaN high‐electron mobility transistor (HEMT) using SAG by PAMBE with nonalloyed ohmic metals and r