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In situ plasma diagnostics for chemical vapor deposition of nano-carbon thin film materials

✍ Scribed by A.N. Obraztsov; A.A. Zolotukhin; A.O. Ustinov; A.P. Volkov; Yu. Svirko; K. Jefimovs


Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
590 KB
Volume
69
Category
Article
ISSN
0167-9317

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In this work, we have studied the influence of the substrate surface condition on the roughness and the structure of the nanostructured DLC films deposited by High Density Plasma Chemical Vapor Deposition. Four methods were used to modify the silicon wafers surface before starting the deposition pro