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Impulse irradiation plasma technology for film deposition

โœ Scribed by I.K. Fetisov; A.A. Filippov; G.V. Khodachenko; D.V. Mozgrin; A.A. Pisarev

Book ID
104266249
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
135 KB
Volume
53
Category
Article
ISSN
0042-207X

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โœฆ Synopsis

A new type of the sputtering discharge and its applications for film deposition are described in the paper. This is a pulse, quasi-stationary and high-current diffuse discharge in the magnetic field. The combination of its properties makes the discharge to be a promising instrument for film deposition. Complex films of high quality have been obtained by using this discharge. Features and areas of application are discussed.

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## Abstract The results of a study of irradiated and unirradiated samples of polymers prepared by plasma polymerization in an inductively coupled radiofrequency (rf) reactor using infrared, elemental, thermogravimetric, and ESR analyses and density and refractive index measurements are presented. T