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Plasma-deposited polymer films. III. The effects of gamma irradiation

✍ Scribed by W. F. Oberbeck JR.; K. G. Mayhan; W. J. James


Publisher
John Wiley and Sons
Year
1978
Tongue
English
Weight
724 KB
Volume
22
Category
Article
ISSN
0021-8995

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✦ Synopsis


Abstract

The results of a study of irradiated and unirradiated samples of polymers prepared by plasma polymerization in an inductively coupled radiofrequency (rf) reactor using infrared, elemental, thermogravimetric, and ESR analyses and density and refractive index measurements are presented. The plasma‐formed polymers studied include polypropylene, poly(ethylbenzene), poly(methyl methacrylate), poly(tetrafluoroethylene), poly(chlorotrifluoroethylene), and poly(trimethylchlorosilane).


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Effect of deposition temperature on the
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## Abstract Plasma CVD is a candidate technology for the fabrication of optical polymer waveguides. It can deposit a film on any surface geometry and any substrate material at a temperature under 200 Β°C in a vacuum process. It also provides good thickness controllability and uniformity of the depos