๐”– Bobbio Scriptorium
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Nanostructures, Microscale Technologies, and Plasma Deposited Films

โœ Scribed by Buddy D. Ratner

Book ID
110319466
Publisher
Springer
Year
2001
Tongue
English
Weight
13 KB
Volume
6
Category
Article
ISSN
1084-0184

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A new type of the sputtering discharge and its applications for film deposition are described in the paper. This is a pulse, quasi-stationary and high-current diffuse discharge in the magnetic field. The combination of its properties makes the discharge to be a promising instrument for film depositi