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Improvement of the SiO2 deposition by 185 nm photolysis of N2O and SiH4 by addition of neopentane

✍ Scribed by Mathieu Petitjean; Nicole Proust; Jean-François Chapeaublanc; Jérôme Perrin


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
372 KB
Volume
54
Category
Article
ISSN
0169-4332

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