✦ LIBER ✦
A comparison of SiO2 thin-film UVCVD rates and mechanisms from SiH4/O2 and SiH4/N2O precursor gases by surface-sensitive infrared spectroscopy
✍ Scribed by C. Debauche; C. Licoppe; J. Flicstein
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 568 KB
- Volume
- 69
- Category
- Article
- ISSN
- 0169-4332
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