✦ LIBER ✦

Improvement of resist mask plasma etching durability by plasma chemical polymerization

✍ Scribed by V.F. Limanova; D.B. Askerov; A.V. Kovalchuk; V.N. Vasilets

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 293 KB
Volume: 17
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(92)90075-3

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Improvement of plasma etching durability

Improvement of plasma etching durability of positive working resist by copolymerization, blending, and crosslinking

✍ Nobuo Ueno; Yasunori Doi; Kazuyuki Sugita; Shigeru Sasaki; Shiro Nagata 📂 Article 📅 1987 🏛 John Wiley and Sons 🌐 English ⚖ 728 KB

EPR investigation of plasma-chemical res

EPR investigation of plasma-chemical resist etching in O2and O2/CF4discharges

✍ F. -W. Breitbarth; E. Ducke; H. -J. Tiller 📂 Article 📅 1990 🏛 Springer 🌐 English ⚖ 876 KB

Increased plasma etch resistance of thin

Increased plasma etch resistance of thin polymeric and photoresist films

✍ N. Vourdas; A.G. Boudouvis; E. Gogolides 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 128 KB

Improving etch selectivity and stability

Improving etch selectivity and stability of novolak based negative resists by fluorine plasma treatment

✍ M.M. Blideran; M. Häffner; B.-E. Schuster; C. Raisch; H. Weigand; M. Fleischer; 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 420 KB

Adhesion improvement of polyester/alumin

Adhesion improvement of polyester/aluminium interface by plasma polymerization pretreatments

✍ Novis, Yvan ;Chtaïb, Mohammed ;Caudano, Roland ;Lutgen, Pierre ;Feyder, Gusty 📂 Article 📅 1989 🏛 Wiley (John Wiley & Sons) 🌐 English ⚖ 236 KB

Improving the resistance of PECVD silico

Improving the resistance of PECVD silicon nitride to dry etching using an oxygen plasma

✍ S.E. Hicks; S.K. Murad; I. Sturrock; C.D.W. Wilkinson 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 292 KB

The resistance of PECVD SiN films to dry etching is increased by more than three orders of magnitude by exposure to an oxygen plasma. In this paper we describe the oxygen treatment. Both the film thickness and the refractive index are modified by the oxygen treatment suggesting a homogenous densific