✦ LIBER ✦
Improving etch selectivity and stability of novolak based negative resists by fluorine plasma treatment
✍ Scribed by M.M. Blideran; M. Häffner; B.-E. Schuster; C. Raisch; H. Weigand; M. Fleischer; H. Peisert; T. Chassé; D.P. Kern
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 420 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0167-9317
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