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Improved electrical parameters of vacuum annealed Ni/4H-SiC (0 0 0 1) Schottky barrier diode

✍ Scribed by Sanjeev K. Gupta; A. Azam; J. Akhtar


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
964 KB
Volume
406
Category
Article
ISSN
0921-4526

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The recrystallization process of the phosphorus ion implantation-induced amorphous layer in 4H-SiC(1 1 2 Γ€0) is investigated in the annealing temperature range from 660 to 720 Β°C by means of Rutherford backscattering spectrometry. The phosphorus ions are multiply implanted to p-type 4H-SiC(1 1 2 Γ€0)