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Impact of plasma treatment on structure and electrical properties of porous low dielectric constant SiCOH material

✍ Scribed by Cheng, Yi-Lung; Huang, Jun-Fu; Chang, Yu-Min; Leu, Jihperng

Book ID
123463851
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
397 KB
Volume
544
Category
Article
ISSN
0040-6090

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