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Impact of plasma post-nitridation on HfO2/Al2O3/SiGe gate stacks toward EOT scaling

✍ Scribed by Han, J.-H.; Zhang, R.; Osada, T.; Hata, M.; Takenaka, M.; Takagi, S.

Book ID: 121376672
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 483 KB
Volume: 109
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2013.03.013

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