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[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Two-dimensional device simulator for cyclic bias application

✍ Scribed by Ohno, Y.; Takahashi, Y.

Book ID: 126755745
Publisher: IEEE
Year: 1997
Weight: 349 KB
Category: Article
ISBN-13: 9780780337756
DOI: 10.1109/SISPAD.1997.621401

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📜 SIMILAR VOLUMES

[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Gridding techniques for the level set method in semiconductor process and device simulation

✍ Kan, E.C.; Ze-Kai Hsiau, ; Rao, V.; Dutton, R.W. 📂 Article 📅 1997 🏛 IEEE ⚖ 602 KB

[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Layout optimization of ESD protection TFO-NMOS by two-dimensional device simulation

✍ Daebin Yim, ; Hyunchul Kim, ; Doohun Song, ; Junho Back, 📂 Article 📅 1997 🏛 IEEE ⚖ 247 KB

[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Application of TCAD to designing advanced DRAM and logic devices

✍ Fukuda, I.; Nishi, K. 📂 Article 📅 1997 🏛 IEEE 🌐 English ⚖ 394 KB

[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Photoresist process optimization for defects using a rigorous lithography simulator

✍ Milor, L.; Orth, L.; Steele, D.; Khoi Phan, ; Xiaolei Li, ; Strojwas, A.; Yung-T 📂 Article 📅 1997 🏛 IEEE ⚖ 425 KB

[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - CMP profile simulation using an elastic model based on nonlinear contact analysis

✍ Yoo-Hyon Kim, ; Tai-Kyung Kim, ; Hoong-Joo Lee, ; Jeong-Taek Kong, ; Sang-Hoon L 📂 Article 📅 1997 🏛 IEEE ⚖ 368 KB

[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Density-gradient simulations of quantum effects in ultra-thin-oxide MOS structures

✍ Ancona, M.G.; Yu, Z.; Lee, W.-C.; Dutton, R.W.; Voorde, P.V. 📂 Article 📅 1997 🏛 IEEE ⚖ 353 KB