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[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Photoresist process optimization for defects using a rigorous lithography simulator

✍ Scribed by Milor, L.; Orth, L.; Steele, D.; Khoi Phan, ; Xiaolei Li, ; Strojwas, A.; Yung-Tao Lin,

Book ID: 126681165
Publisher: IEEE
Year: 1997
Weight: 425 KB
Category: Article
ISBN-13: 9780780337756
DOI: 10.1109/SISPAD.1997.621335

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📜 SIMILAR VOLUMES

[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Two-dimensional device simulator for cyclic bias application

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[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Gridding techniques for the level set method in semiconductor process and device simulation

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[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Layout optimization of ESD protection TFO-NMOS by two-dimensional device simulation

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[IEEE SISPAD '97. 1997 International Con

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✍ Fukuda, I.; Nishi, K. 📂 Article 📅 1997 🏛 IEEE 🌐 English ⚖ 394 KB

[IEEE SISPAD '97. 1997 International Con

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[IEEE SISPAD '97. 1997 International Con

[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Density-gradient simulations of quantum effects in ultra-thin-oxide MOS structures

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