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[IEEE Proceedings of the 34th European Solid-State Device Research Conference - Leuven, Belgium (21-23 Sept. 2004)] Proceedings of the 30th European Solid-State Circuits Conference (IEEE Cat. No.04EX850) - Electrical characterization and mechanical modeling of process induced strain in 65 nm CMOS technology

✍ Scribed by Ortolland, C.; Orain, S.; Rosa, J.; Morin, P.; Arnaud, F.; Woo, M.; Poncet, A.; Stolk, P.

Book ID: 126764586
Publisher: IEEE
Year: 2004
Tongue: English
Weight: 289 KB
Category: Article
ISBN-13: 9780780384781
DOI: 10.1109/ESSDER.2004.1356508

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