𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Gate stack etch induced reliability issues in nitrided-based trapping storage cells

✍ Scribed by Yeh, T. H.; Lin, S. W.; Chen, Y. J.; Chen, K. F.; Huang, J. S.; Cheng, C. H.; Chong, L. H.; Ku, S. H.; Zous, N. K.; Huang, I. J.; Han, T. T.; Chen, M. S.; Lu, W. P.; Chen, K. C.; Wang, Tahui; Lu, Chih-Yuan

Book ID: 126693125
Publisher: IEEE
Year: 2010
Weight: 400 KB
Category: Article
ISBN: 1424450632
DOI: 10.1109/VTSA.2010.5488953

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