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[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - A 30 nm gate-all-around poly-Si nano wire thin-film transistor

✍ Scribed by Lee, Chen-Ming; Tsui, Bing-Yue

Book ID: 126647231
Publisher: IEEE
Year: 2010
Weight: 392 KB
Category: Article
ISBN: 1424450632
DOI: 10.1109/VTSA.2010.5488964

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