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[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Single-crystalline Ge p-channel thin-film transistors with Schottky-barrier source/drain on flexible polyimide substrates

✍ Scribed by Hsu, William; Lin, C.-M.; Peng, C.-Y.; Chen, Y.-Y.; Chen, Y.-T.; Ho, W.-S.; Liu, C. W.

Book ID: 126738573
Publisher: IEEE
Year: 2010
Weight: 589 KB
Category: Article
ISBN: 1424450632
DOI: 10.1109/VTSA.2010.5488959

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