𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Scalability with silicon nitride encapsulation layer for Ti/HfOx pillar RRAM

✍ Scribed by Gu, Pei-Yi; Chen, Yu-Sheng; Lee, Heng-Yuan; Chen, Pang-Shiu; Liu, Wen-Hsing; Chen, Wei-Su; Hsu, Yen-Ya; Chen, Frederick; Tsai, Ming-Jinn

Book ID: 123619755
Publisher: IEEE
Year: 2010
Weight: 948 KB
Category: Article
ISBN: 1424450632
DOI: 10.1109/VTSA.2010.5488909

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE Proceedings of 2010 International

[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Carbon based graphene nanoelectronics technologies

✍ Sung, C. Y.; Lin, Y. M.; Hannon, J.; Tromp, R.; Chiu, H. Y.; Valdes-Garcia, A.; 📂 Article 📅 2010 🏛 IEEE ⚖ 573 KB

[IEEE Proceedings of 2010 International

[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Leading edge foundry Si-based RF technology for wireless communication

✍ Tseng, H. C.; Hua, W.-C.; Chen, C. H.; Ho, C. C. 📂 Article 📅 2010 🏛 IEEE ⚖ 463 KB

[IEEE Proceedings of 2010 International

[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Investigation of stability and AC performance of sub-threshold FinFET SRAM

✍ Fan, Ming-Long; Wu, Yu-Sheng; Hu, Vita Pi-Ho; Su, Pin; Chuang, Ching-Te 📂 Article 📅 2010 🏛 IEEE ⚖ 544 KB

[IEEE Proceedings of 2010 International

[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Gate stack etch induced reliability issues in nitrided-based trapping storage cells

✍ Yeh, T. H.; Lin, S. W.; Chen, Y. J.; Chen, K. F.; Huang, J. S.; Cheng, C. H.; Ch 📂 Article 📅 2010 🏛 IEEE ⚖ 400 KB

[IEEE Proceedings of 2010 International

[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - On the 60 mV/dec @300 K limit for MOSFET subthreshold swing

✍ Cheung, Kin P. 📂 Article 📅 2010 🏛 IEEE ⚖ 298 KB

[IEEE Proceedings of 2010 International

[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Effective Schottky Barrier lowering for contact resistivity reduction using silicides as diffusion sources

✍ Zhang, Zhen; Pagette, F.; D'Emic, C.; Yang, B.; Lavoie, C.; Ray, A.; Zhu, Y.; Ho 📂 Article 📅 2010 🏛 IEEE ⚖ 893 KB