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[IEEE Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Hsin Chu, Taiwan (2010.04.26-2010.04.28)] Proceedings of 2010 International Symposium on VLSI Technology, System and Application - Strain engineering in nanoscale CMOS FinFETs and methods to optimize RS/D

✍ Scribed by Smith, Casey; Parthasarathy, Srivatsan; Coss, Brian E.; Williams, Jason; Adhikari, Hemant; Smith, Greg; Sassman, Barry; Hussain, Muhammad Mustafa; Majhi, Prashant; Jammy, Raj

Book ID: 120177815
Publisher: IEEE
Year: 2010
Weight: 855 KB
Category: Article
ISBN: 1424450632
DOI: 10.1109/VTSA.2010.5488905

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